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作者 Li, Sheng S., 1938-

標題 The theoretical and experimental study of the temperature and dopant density dependence of hole mobility, effective mass, and resistivity in boron-doped silicon / Sheng S. Li, Department of Electrical Engineering, University of Florida.

出版資料 [Washington] : Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off., 1979.

複本

說明 vi, 42 p. : ill. ; 27 cm.
系列 Semiconductor measurement technology
NBS special publication ; 400-47
NBS special publication ; 400-47.
Notes "This activity was supported by the Defense Advanced Research Projects Agency and the National Science Foundation."
With: Bound With: Automated photomask inspection / Donald B. Novotny and Dino R. Ciarlo.
Bibliography Includes bibliographical references.
Notes CODEN: XNBSAV.
主題 Holes (Electron deficiencies)
Semiconductor doping.
Silicon -- Defects.
添加作者 United States. National Bureau of Standards.
University of Florida. Department of Electrical Engineering.
United States. Advanced Research Projects Agency.
National Science Foundation (U.S.)
國際標準書號 pbk. : $2.25
政府出版物號碼 247
C 13.10:400-47