Ma bibliothèque

Demande Ajouter à Mes listes Ajouter à Mon panier Affichage MARC Retour en feuilletage
     
Limiter la recherche aux exemplaires disponibles
Notice précédente Notice suivante
Ressources
Plus d' Information
* Search MOBIUS *
Imprimé

Titre Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California / sponsored and published by SPIE--the International Society for Optical Engineering ; Susan K. Jones, chair/editor.

Adresse Bibliographique Bellingham, WA : SPIE, 1996.

Exemplaires

Localisation Cote Statut
 Innovative University Durant Collection  TK7874 .M4375 1996    AVAILABLE
Description xiii, 2725 p : ill ; 28 cm.
Collection Proceedings / SPIE--the International Society of Optical Engineering ; v. 2725
Proceedings of SPIE--the International Society for Optical Engineering ; v. 2725.
Notes "This volume contains the origianl papers presented at the tenth annual SPIE Conference on Metrology, Inspection, and Process Control for Microlithography"--Introd.
Bibliography Includes bibliographical references.
Sujet Integrated circuits -- Inspection -- Congresses.
Integrated circuits -- Measurement -- Congresses.
Microlithography -- Congresses.
Autre Auteur Jones, Susan K.
Society of Photo-optical Instrumentation Engineers.
SPIE Conference on Metrology, Inspection, and Process Control for Microlithography (10th : 1996 : Santa Clara, Calif)
ISBN 0819421014 (pbk)
Permalien