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Titre Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan / Hiroaki [i.e. Hiraoki] Morimoto, editor ; sponsored by Photomask Japan, BACUS, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations for the symposium, Japan Society of Applied Physics, Japan Society for Precision Engineering, [and] Institute of Electrical Engineers of Japan ; cooperating organization for technical exhibit, SEMI Japan.

Adresse Bibliographique

Bellingham, Wash., USA : SPIE, c2000.

Localisation	Cote	Statut
Innovative University Durant Collection	TK7872.M3 P46 2000	AVAILABLE

Description	xv, 750 p : ill ; 28 cm.
Collection	SPIE proceedings series ; v. 4066
	Proceedings of SPIE--the International Society for Optical Engineering ; v. 4066.
Notes	Earlier proceedings have title: Photomask and X-ray mask technology.
Bibliography	Includes bibliographical references and index.
Sujet	Masks (Electronics)
	Integrated circuits -- Masks.
	X-ray lithography.
	Microlithography.
	Optoelectronic devices -- Design and construction.
Autre Auteur	Morimoto, Hiraoki.
	Photomask Japan.
	BACUS (Technical group)
	Society of Photo-optical Instrumentation Engineers.
	Ōyō Butsuri Gakkai.
	Seimitsu Kōgakkai.
	Denki Gakkai (1888)
	Semiconductor Equipment and Materials International (Japan)
Autre Titre	Photomask and x-ray mask technology.
ISBN	0819437026