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SUBJECTS (1-5 之 5)
Masks Integrated Circuits
1
PRINTED MAT
 

Accurate linewidth measurements on integrated-circuit photomasks



Washington : Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off., 1980. 1980

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2
PRINTED MAT
 

Federal statutory protection for mask works.


Library of Congress. Copyright Office.
[Washington, D.C.] (101 Independence Ave., SE, Washington 20559-6000) : [Library of Congress, Copyright Office], 1998. 1998

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3
PRINTED MAT
 

Federal statutory protection for mask works.


Library of Congress. Copyright Office.
[Washington, DC] (101 Independence Ave., SE, Washington 20559-6000) : U.S. Copyright Office, [2004] 2004

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4
PRINTED MAT
 

Optical and dimensional-measurement problems with photomasking in microelectronics


Jerke, John M.
Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1975. 1975

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5
PRINTED MAT
 

Photomask and next-generation lithography mask technology VII : 12-13 April 2000, Yokohama, Japan



Bellingham, Wash., USA : SPIE, c2000. c2000

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