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標題 Accurate linewidth measurements on integrated-circuit photomasks / John M. Jerke, editor, Electron Devices Division, Center for Electronics and Electrical Engineering, National Engineering Laboratory, National Bureau of Standards.

出版資料	Washington : Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off., 1980.

複本

說明	x, 154 p. : ill. ; 26 cm.
系列	Semiconductor measurement technology
	NBS special publication ; 400-43
	NBS special publication ; 400-43.
Notes	This activity was supported by the Defense Advanced Research Projects Agency and the National Bureau of Standards.
	Issued Feb. 1980.
Bibliography	Includes bibliographical references.
Notes	CODEN: XNBSAV.
With:	Bound With: Microelectronic test pattern NBS-4 /
主題	Integrated circuits -- Masks.
	Optical measurements.
添加作者	Jerke, John M.
	Center for Electronics and Electrical Engineering (U.S.). Electron Devices Division.
	United States. Defense Advanced Research Projects Agency.
	United States. National Bureau of Standards.
國際標準書號	pbk. : $5.00
政府出版物號碼	247
	C 13.10:400-43